Engineering Thin Films and Nanostructures with Ion Beams (Optical Science and Engineering) by Emile Knystautas
Publisher: CRC Press (April 6, 2005) | ISBN: 082472447X | Pages: 592 | PDF | 29.82 MB

While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.